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Low Temperature Plasma Physics. Fundamental Aspects And Applications (Relié)

Karl-H Schoenbach, Rainer Hippler, Sigismund Pfau, Martin Schmidt

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  • Wiley-VCH

  • Paru le : 30/04/2001
Plasma physics is a very active area of research located on the boundaries between physics, chemistry and materials science. Recent technological developments,... > Lire la suite
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Plasma physics is a very active area of research located on the boundaries between physics, chemistry and materials science. Recent technological developments, e.g. in plasma etching or plasma deposition, have led to a revived interest in plasma physics and technology. This volume describes in detail fundamentals and applications of low-temperature plasma physics including newest achievements. An international team of authors presents most recent successes in our understanding of how plasmas behave and put a strong focus on the links between theory and experiment or technological process.
    • Characteristics of low-temperature plasmas under non-thermal conditions: a short summary
    • Electron kinetics in weakly ionized plasmas
    • Elementary collision processes in plasmas
    • Fundamental processes in plasma-surface interactions
    • Modeling of plasma-wall interaction
    • Langmuir probe diagnostics of low-temperature plasmas
    • Diagnostics of non-equilibrium molecular plasmas using emission and absorption spectroscopy
    • Mass spectrometric diagnostics
    • Ellipsometric analysis of plasma-treated surfaces
    • Characterization of thin solid films
    • Plasma sources
    • Reactive non-thermal plasmas; chemical quasi-equilibria, similarity principles and macroscopic kinetics
    • High-pressure plasmas: dielectric-barrier and corona discharges; properties and technical applications
    • Transient plasma-assisted diesel exhaust remediation
    • Plasma display panel
    • Low-pressure discharge light sources
    • High-pressure plasma light sources
    • Plasma etching in microelectronics
    • Low-temperature plasmas for polymer surface modification
    • Plasma-enhanced deposition of superhard thin films
    • Markets for plasma technology
  • Date de parution : 30/04/2001
  • Editeur : Wiley-VCH
  • ISBN : 3-527-28887-2
  • EAN : 9783527288878
  • Présentation : Relié
  • Nb. de pages : 523 pages
  • Poids : 1.12 Kg
  • Dimensions : 17,7 cm × 24,5 cm × 3,2 cm
Karl-H Schoenbach et Rainer Hippler - Low Temperature Plasma Physics. Fundamental Aspects And Applications.
Low Temperature Plasma Physics. Fundamental Aspects And Applications
122,40 €
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